Electrodeposition and morphological characterization of NiSx coatings on nickel foam
DOI:
https://doi.org/10.24054/rcta.v2i48.4560Keywords:
electrodeposition, nickel sulfide, nickel foam, NiSx coatings, FESEM, EDX, surface morphology, Ni/S ratioAbstract
This work evaluates two electrodeposition routes for obtaining nickel sulfide (NiSx) coatings on nickel foam substrates. The objective was to compare the effect of deposition conditions on surface morphology, coating thickness, and the elemental Ni/S ratio of the resulting films. The first route was developed using potentiodynamic electrodeposition at a scan rate of 5 mV/s, between -0.54 and -1.44 V, for eight cycles. The second route was carried out using two current density steps, applying 10 mA/cm2 for 90 min and 100 mA/cm2 for 75 min. The resulting coatings were characterized by field-emission scanning electron microscopy (FESEM) and energy-dispersive X-ray spectroscopy (EDX). Synthesis 1 produced a relatively uniform film with a fine granular morphology and lamellar growth associated with the deposition cycles, with an average thickness of approximately 720 nm and a Ni/S atomic ratio close to 1:1. Synthesis 2 generated a cauliflower-like surface morphology, with an average thickness of approximately 700 nm and a Ni/S atomic ratio close to 2.5:1. These results show that the electrodeposition conditions significantly modify the microstructure, growth mode, and elemental composition of NiSx coatings on nickel foam. This study provides useful experimental information for the design and optimization of nickel sulfide films obtained by electrodeposition.
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Copyright (c) 2026 Claudia Patricia Parra Medina, Edwin García Quintero, Héctor Darío Sánchez Londoño
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